Turning difficult surfaces into perfect partners for inking, coating, laminating, and film deposition.
Through low-pressure (vacuum) plasma cleaning, activation, micro-etching, and deoxidation, we effectively enhance surface energy and hydrophilicity, strengthening adhesion performance in subsequent sputtering, printing, coating, and lamination processes.
Enhanced surface energy, smooth and uniform coating, with less delamination and orange peel.
Programmable and fully traceable process parameters ensure uniform treatment and stable yield.
Low thermal load, solvent-free/VOC-free, safer for both personnel and the environment.
Vacuum pumping
Establish a stable chamber pressure and low-contamination environment
Gas introduction
Select Ar, O₂, N₂, or their combination based on target properties
DC pre-treatment plasma ignition
Active species clean, activate, and micro-etch the substrate surface
Exhaust & rewinding
Remove by-products; continuous processing ensures consistent results
Product Packaging
The products are vacuum-sealed to prevent oxidation and contamination, thereby extending their shelf like and maintaining usability.
Reduces contamination and humidity interference for higher uniformity
Preserves transparency and dimensional stability of materials
DOE-optimized parameters, measurement reports, mass-production SOPs, and audit support
Substrate/material type & thickness, target dyne level or adhesion grade, expected line speed & web width, and downstream process (sputtering, coating, or lamination).
※ We will provide a tailored sampling plan and schedule within 48 hours. Let's help you achieve superior surface performance and reliable production!